What does immersion DUV lithography do to etch circuits on silicon?

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Immersion DUV lithography uses ultraviolet light to etch microscopic circuits onto silicon wafers

Immersion deep ultraviolet (DUV) lithography is a chipmaking step that uses ultraviolet light to transfer patterns for microscopic circuits onto silicon. In this process, the ultraviolet light is used to etch circuit features at very small scales on the silicon substrate, forming the basis of the chip’s circuitry.
It transfers ultraviolet light patterns onto silicon
Immersion DUV lithography works by using ultraviolet light as the patterning tool during fabrication. The patterned light is applied to create circuit shapes on silicon, which are then used to build the microscopic circuitry required for semiconductor devices.
It etches circuit structures at microscopic scale
The key function described is that the process uses ultraviolet light to etch microscopic circuits onto silicon. That means the circuit lines and features are formed through light-driven patterning that results in etched structures on the wafer.
“Immersion” refers to a specific DUV patterning approach
In semiconductor manufacturing, “DUV” identifies the use of deep ultraviolet light for lithography, while “immersion” refers to an approach that improves how that light is used for fine pattern transfer. The reference explanation ties the method to using ultraviolet light to etch microscopic circuits on silicon during chip fabrication.
The goal is faster chip development and production
Producing DUV lithography machines is linked to accelerating chip development and production in China. The underlying idea in the coverage is that the ability to make these machines can support building processors and related technologies through domestic manufacturing progress.

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What does immersion DUV lithography do to etch circuits on silicon?

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